An optical grating filter dry-etched on a LiNbO3 substrate

Satoshi Shinada; Tetsuya Kawanishi; Takahide Sakamoto; Masayuki Izutsu

doi:10.1587/elex.3.347

An optical grating filter dry-etched on a LiNbO₃ substrate

Satoshi Shinada^*, Tetsuya Kawanishi, Takahide Sakamoto, Masayuki Izutsu

^*この研究の対応する著者

研究成果: Article › 査読

1 被引用数 (Scopus)

抄録

We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO₃ using inductively coupled plasma etching with C ₄F₈/Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.

本文言語	English
ページ（範囲）	347-352
ページ数	6
ジャーナル	ieice electronics express
巻	3
号	14
DOI	https://doi.org/10.1587/elex.3.347
出版ステータス	Published - 2006 7月 25
外部発表	はい

ASJC Scopus subject areas

電子材料、光学材料、および磁性材料
凝縮系物理学
電子工学および電気工学

文献へのアクセス

10.1587/elex.3.347

他のファイルとリンク

引用スタイル

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