Analysis of cathodic reaction process of SiCl4 during Si electrodeposition in ionic liquids

Yasuhiro Tsuyuki, Tatsuki Fujimura, Masahiro Kunimoto, Yasuhiro Fukunaka, Piero Pianetta, Takayuki Homma

研究成果: Article査読

4 被引用数 (Scopus)

抄録

Elementary steps in the electrochemical reduction process of SiCl4 in trimethyl-n-hexylammonium bis(trifluoromethylsulfonyl) imide (TMHATFSI) was investigated, focusing on molecular level behavior of the reactants at solid-liquid interface. Electrochemical measurements using an electrochemical quartz crystal microbalance (EQCM) identified a reduction peak corresponding to Si electrodeposition and several elementary steps with stable intermediates forming prior to the deposition. For detailed analysis, X-ray reflectivity (XRR) measurements with synchrotron radiation were applied in situ. The change in reflectivity of the electrode surface during the deposition was found to be due to the formation of a polymer-like Si such as Si2Cl6, which is an intermediate layer during the deposition process. These results were theoretically supported by density functional theory (DFT) calculations: after an electron transfers from the electrode, the Si in SiCl4 forms the bond with another SiCl4, rather than the Si of the substrate, resulting in the formation of the intermediate structure. These data suggest an elementary step in the SiCl4 reduction process which can be described as follows; when SiCl4 is reduced, a polymer-like Si form such as Si2Cl6 is generated. This intermediate species further reacts with other Si reactants after receiving additional electrons, which then finally deposits as Si on the substrate.

本文言語English
ページ(範囲)D994-D998
ジャーナルJournal of the Electrochemical Society
164
14
DOI
出版ステータスPublished - 2017

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

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