Analysis of electrical properties of insulators (Si3N 4, SiO2, AlN, and Al2O3)/0.5 nm Si3N4/AlGaN/GaN heterostructures

Narihiko Maeda*, Masanobu Hiroki, Noriyuki Watanabe, Yasuhiro Oda, Haruki Yokoyama, Takuma Yagi, Toshiki Makimoto, Takatomo Enoki, Takashi Kobayashi

*この研究の対応する著者

研究成果: Conference article査読

4 被引用数 (Scopus)

抄録

The electrical properties in AlGaN/GaN heterostructures with Si- and Al-based insulators (Si3N4, SiO2, AlN, and A12O3) have been examined and analyzed. By insulators deposition, significant increase in the two-dimensional electron gas (2DEG) density (Ns) was observed with the order of NS(Al 2O3) > NS(AlN) ̃ Ns(SiO 2) > Ns(Si3N4) > No (No: Ns without insulators). As the result, the decrease in the sheet resistance (R) was observed; the smallest order of R was R(Al 2O3) > R(AlN) > R(Si3N4) > Ro ̃ R(SiO2) (Ro: R without insulator). The insulators deposition effect has thus been shown to be significant and different among insulators. The increase in Ns was analyzed in terms of the change in the potential profile, and the observed differences in N s among insulators have been interpreted. The band engineering including insulators is indispensable in understanding and designing AlGaN/GaN HFETs, since insulators are commonly used for the surface passivation as well as for the gate insulators, and the insulators deposition is to alter the essential device parameters such as the source resistance.

本文言語English
ページ(範囲)2712-2715
ページ数4
ジャーナルPhysica Status Solidi (C) Current Topics in Solid State Physics
4
7
DOI
出版ステータスPublished - 2007
外部発表はい
イベントInternational Workshop on Nitride Semiconductors, IWN 2006 - Kyoto, Japan
継続期間: 2006 10 222006 10 27

ASJC Scopus subject areas

  • 凝縮系物理学

フィンガープリント

「Analysis of electrical properties of insulators (Si<sub>3</sub>N <sub>4,</sub> SiO<sub>2,</sub> AlN, and Al<sub>2</sub>O<sub>3</sub>)/0.5 nm Si<sub>3</sub>N<sub>4</sub>/AlGaN/GaN heterostructures」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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