Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group

K. Kato, T. Miyake, Y. Beppu, T. Tanii, I. Ohdomari

研究成果: Conference contribution

元の言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
ページ60-61
ページ数2
DOI
出版物ステータスPublished - 2007 12 1
イベントs20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
継続期間: 2007 11 52007 11 8

出版物シリーズ

名前Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Other

Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
Japan
Kyoto
期間07/11/507/11/8

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

これを引用

Kato, K., Miyake, T., Beppu, Y., Tanii, T., & Ohdomari, I. (2007). Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group. : Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 60-61). [4456104] (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). https://doi.org/10.1109/IMNC.2007.4456104