Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

M. Zhao*, H. Oigawa, J. Ji, T. Ueda

*この研究の対応する著者

研究成果: Conference contribution

抄録

This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.

本文言語English
ホスト出版物のタイトルProceedings of IEEE Sensors
ページ1693-1696
ページ数4
DOI
出版ステータスPublished - 2011
イベント10th IEEE SENSORS Conference 2011, SENSORS 2011 - Limerick
継続期間: 2011 10 282011 10 31

Other

Other10th IEEE SENSORS Conference 2011, SENSORS 2011
CityLimerick
Period11/10/2811/10/31

ASJC Scopus subject areas

  • 電子工学および電気工学

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