Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto, Takeshi Mizota, Hidehiko Nonaka, Akira Kurokawa, Shingo Ichimura

研究成果: Article

15 引用 (Scopus)

抜粋

Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

元の言語English
ページ(範囲)164-166
ページ数3
ジャーナルSurface and Interface Analysis
37
発行部数2
DOI
出版物ステータスPublished - 2005 2
外部発表Yes

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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