Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto; Takeshi Mizota; Hidehiko Nonaka; Akira Kurokawa; Shingo Ichimura

doi:10.1002/sia.1955

Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto^*, Takeshi Mizota, Hidehiko Nonaka, Akira Kurokawa, Shingo Ichimura

^*この研究の対応する著者

研究成果: Article › 査読

15 被引用数 (Scopus)

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Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

本文言語	English
ページ（範囲）	164-166
ページ数	3
ジャーナル	Surface and Interface Analysis
巻	37
号	2
DOI	https://doi.org/10.1002/sia.1955
出版ステータス	Published - 2005 2月
外部発表	はい

ASJC Scopus subject areas

化学 (全般)
凝縮系物理学
表面および界面
表面、皮膜および薄膜
材料化学

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10.1002/sia.1955

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Application of metal cluster complex ion beam for low damage sputtering

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