抜粋
Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 164-166 |
| ページ数 | 3 |
| ジャーナル | Surface and Interface Analysis |
| 巻 | 37 |
| 発行部数 | 2 |
| DOI | |
| 出版物ステータス | Published - 2005 2 |
| 外部発表 | Yes |
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
フィンガープリント Application of metal cluster complex ion beam for low damage sputtering' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。
これを引用
Fujimoto, T., Mizota, T., Nonaka, H., Kurokawa, A., & Ichimura, S. (2005). Application of metal cluster complex ion beam for low damage sputtering. Surface and Interface Analysis, 37(2), 164-166. https://doi.org/10.1002/sia.1955