Application of UV-light excited ozone to large-sized si wafer at low temperature

Naoto Kameda^*, Shigeru Saito, Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Hidehiko Nonaka, Shingo Ichimura

^*この研究の対応する著者

研究成果: Article › 査読