Applications and leading-edge technology

Jun Taniguchi*, Hidetoshi Shinohara, Jun Mizuno, Mitsunori Kokubo, Kazutoshi Yakemoto, Hiroshi Goto

*この研究の対応する著者

研究成果: Chapter

抄録

This chapter outlines the advanced nanoimprinting technologies and its applications, and describes the worldwide trends in nanoimprinting technologies and topics related to them. The resolution limit of nanoimprint lithography (NIL) is mentioned, improved nanoimprinting technologies are introduced, and roll-to-roll nanoimprinting technologies are described. The resolution limit of NIL depends on the fineness of the molds used, and the molds are usually fabricated using electron beam lithography. The chapter explains the outline of the thermal imprint process, thermal imprint apparatus and the micro/nano melt transcription molding process. Recently, the amount of research and development on element nanoimprint technologies, including molding, demolding, and removal of residual layer, has been increasing. The imprint resin requires several functionalities, including high resolution, good demolding, and high durability against electrodeposition and dry etching. In contrast, the imprint process has been applied for many electronic, optical, and chemical/biochemical devices.

本文言語English
ホスト出版物のタイトルNanoimprint Technology
ホスト出版物のサブタイトルNanotransfer for Thermoplastic and Photocurable Polymers
出版社wiley
ページ169-205
ページ数37
ISBN(電子版)9781118535059
ISBN(印刷版)9781118359839
DOI
出版ステータスPublished - 2013 6 18

ASJC Scopus subject areas

  • 工学(全般)

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