Attachment of the sulfonic acid group in the interlayer space of a layered alkali silicate, octosilicate

Takanori Nakamura, Makoto Ogawa*

*この研究の対応する著者

研究成果: Article査読

20 被引用数 (Scopus)

抄録

The surface modification of a layered alkali silicate, octosilicate (Na 2Si 8O 17•nH2O), with a sulfonic acid group was conducted. The sulfonic acid group was attached to the silicate layer by the reaction of octosilicate with phenethyl(dichloro)methylsilane and the subsequent sulfonation of the attached phenethyl groups with chlorosulfonic acid. The modified octosilicate is a solid acid as indicated by the intercalation of dodecylamine. A systematic expansion of the interlayer space was observed by the ion exchange with a series of alkyltrimethylammonium ions to show the variation of the layer charge density.

本文言語English
ページ(範囲)7505-7511
ページ数7
ジャーナルLangmuir
28
19
DOI
出版ステータスPublished - 2012 5 15

ASJC Scopus subject areas

  • 電気化学
  • 凝縮系物理学
  • 表面および界面
  • 材料科学(全般)
  • 分光学

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