Bipolar transistor with a buried layer formed by high-energy ion implantation for subhalf-micron bipolar-complementary metal oxide semiconductor LSIs

Takashi Kuroi, Youji Kawasaki, Yoshiyuki Ishigaki, Yasushi Kinoshita, Masahide Inuishi, Katsuhiro Tsukamoto, Natsuro Tsubouchi

研究成果: Article › 査読