Change in surface morphology of polytetrafluoroethylene by reactive ion etching

Tomohiro Takahashi*, Yuki Hirano, Yuya Takasawa, Tomoko Gowa, Naoyuki Fukutake, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

*この研究の対応する著者

研究成果: Article査読

20 被引用数 (Scopus)

抄録

Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

本文言語English
ページ(範囲)253-256
ページ数4
ジャーナルRadiation Physics and Chemistry
80
2
DOI
出版ステータスPublished - 2011 2月

ASJC Scopus subject areas

  • 放射線

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