抄録
The change of electroless Ni-Mo-P alloy films was investigated using a pulse heating method that provided a very high heating rate (up to 106 K min-1) and a very short heating time (200 ms). Both amorphous and crystalline Ni-Mo-P alloy films under “as-plated” conditions were prepared by controlling the Na2Mo04 concentration in the plating baths. The heat change properties of both amorphous and crystalline films during the pulse heating were compared with those during conventional long-time annealing, by measuring the specific resistance, the temperature coefficient of resistance, and the saturation magnetization. For both amorphous and crystalline Ni-Mo-P alloy films under “as-plated” conditions, the crystallization and the phase transformation processes which occurred during the pulse heating were different from the corresponding processes observed in the conventionally annealed films. Furthermore, the film structure after the higher-power pulse heating was also found to be different from that after conventional annealing at 700°C for lh. The Ni-Mo-P alloy film after the pulse heating was very stable against change in the later conventional annealing at 700°C for lh.
本文言語 | English |
---|---|
ページ(範囲) | 3418-3422 |
ページ数 | 5 |
ジャーナル | Journal of the Electrochemical Society |
巻 | 136 |
号 | 11 |
DOI | |
出版ステータス | Published - 1989 11月 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 再生可能エネルギー、持続可能性、環境
- 表面、皮膜および薄膜
- 電気化学
- 材料化学