Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss

Kyoya Takano*, Shuhei Amakawa, Kosuke Katayama, Mizuki Motoyoshi, Minoru Fujishima

*この研究の対応する著者

研究成果: Conference contribution

9 被引用数 (Scopus)

抄録

A characteristic impedance determination technique that can be used in the CMOS process with a large substrate loss is proposed. Furthermore, it is shown using image parameters that the propagation constant is obtained directly from Thru and Line without determining error networks. The validity of the characteristic impedance obtained by the proposed method is shown using the measurement and EM simulation results. The calibration patterns used for the validation check were fabricated using the 40 nm CMOS process.

本文言語English
ホスト出版物のタイトル79th ARFTG Microwave Measurement Conference
ホスト出版物のサブタイトルNon-Linear Measurement Systems, ARFTG 2012
DOI
出版ステータスPublished - 2012 10 29
外部発表はい
イベント79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012 - Montreal, QC, Canada
継続期間: 2012 6 222012 6 22

出版物シリーズ

名前79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012

Other

Other79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012
国/地域Canada
CityMontreal, QC
Period12/6/2212/6/22

ASJC Scopus subject areas

  • 電子工学および電気工学

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