Characteristics of Narrow-Channel Polysilicon Thin-Film Transistors

Noriyoshi Yamauchi

研究成果査読

13 被引用数 (Scopus)

抄録

The effect of channel width on the characteristics of polvsilicon thin-film transistors (TFT) was investigated. n-channel TFT’s with a channel length L of 20 μm and a channel width W ranging from 20 to 0.5 pm were fabricated and characterized. The most prominent effect of reducing the TFT channel was a drastic decrease in threshold voltage when W was reduced to less than 5 pm. This decrease was found to be correlated with the decrease in grain-boundary trap density.

本文言語English
ページ(範囲)1967-1968
ページ数2
ジャーナルIEEE Transactions on Electron Devices
38
8
DOI
出版ステータスPublished - 1991 8

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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