Characterization of anisotropic strain relaxation after mesa isolation for strained SGOI and SiGe/Si structure with newly developed high-NA and oil-immersion Raman method

Koji Usuda*, Daisuke Kosemura, Motohiro Tomita, Atsushi Ogura, Tsutomu Tezuka

*この研究の対応する著者

研究成果: Conference contribution

フィンガープリント

「Characterization of anisotropic strain relaxation after mesa isolation for strained SGOI and SiGe/Si structure with newly developed high-NA and oil-immersion Raman method」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science