CHARACTERIZATION OF DIAMOND PARTICLES AND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION USING HIGH-VOLTAGE ELECTRON MICROSCOPY.

Hiroshi Kawarada, King Sheng Mar, Jun ichi Suzuki, Toshimichi Ito, Hirotaro Mori, Hiroshi Fujita, Akio Hiraki

研究成果: Article査読

抄録

The internal and internal structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapor deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects - micro-twin lamellae or stacking faults - in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.

本文言語English
ページ(範囲)1904-1906
ページ数3
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
26
11
出版ステータスPublished - 1987 11 1
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

フィンガープリント 「CHARACTERIZATION OF DIAMOND PARTICLES AND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOUR DEPOSITION USING HIGH-VOLTAGE ELECTRON MICROSCOPY.」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル