Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

T. Souno, H. Nishikawa*, M. Hattori, Y. Ohki, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa

*この研究の対応する著者

研究成果: Conference article査読

7 被引用数 (Scopus)

抄録

We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

本文言語English
ページ(範囲)277-280
ページ数4
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
210
DOI
出版ステータスPublished - 2003 9月
イベント8th International Conference on Nuclear Microprobe Technology - Takasaki, Japan
継続期間: 2002 9月 82002 9月 13

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学
  • 器械工学

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