抄録
Structural and electrical properties of plasma-deposited silicon nitride (SiN) have been studied. The compositional ratio of Si to N estimated by Auger analysis is found to be uniform in the direction of the film thickness. The numbers of Si-H and N-H bonds of the order of 10**2**1/cm**3 have been obtained bY calculating the vibrational spectra. The two types of trapping states whch are responsible for the Poole-Frenkel conduction are found. the barrier height at the SiN/Si interface is determined. Current transport mechanism through SiN films are quantitatively discussed, and it is shown that the carrier transport is dominated by the Fowler-Nordheim tunneling at low temperatures and by the Poole-Frenkel conduction at high temperatures.
本文言語 | English |
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ページ(範囲) | 5470-5474 |
ページ数 | 5 |
ジャーナル | Journal of Applied Physics |
巻 | 51 |
号 | 10 |
DOI | |
出版ステータス | Published - 1980 10月 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(全般)
- 物理学および天文学(その他)