Characterization of roughness and defects at an Si/SiO2 interface formed by lateral solid phase epitaxy using high-resolution electron microscopy

Hiroshi Kawarada*, Tomo Ueno, Iwao Ohdomari, Yasuo Kunii

*この研究の対応する著者

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Using high-resolution transmission electron microscopy, we have characterized on an atomic scale the interfacial roughness and the interfacial defects at the Si/SiO2 interface obtained by lateral solid phase epitaxial growth of Si on SiO2. At the matrix/SiO2 interface, the protrusions of Si with 2-3 Si(200) lattice planes make the interface indented. These images can be explained by the pyramid-type or edge-type pseudo Si(100)/SiO2 interface models composed of small {111} facets. Defects, mainly microtwins, are localized only within 50 nm from the interface, and are adjacent to the SiO2. It indicates that microtwins are interface-related and are supposed to form from atomic scale indents of the original a-Si/SiO2 interface.

本文言語English
ページ(範囲)2641-2644
ページ数4
ジャーナルJournal of Applied Physics
63
8
DOI
出版ステータスPublished - 1988 12月 1

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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