Combinatorial surface-enhanced raman spectroscopy and spectroscopic ellipsometry of silver Island films

研究成果: Article

36 引用 (Scopus)

抄録

Utilizing a combinatorial method, we used spectroscopic ellipsometry to determine the dielectric functions of silver island films over a large range of sizes and morphologies from the percolation threshold down to average particle size smaller than 5 nm. We measured films on silicon substrates with 2 and 20 nm oxide layers and compared the surface-enhanced Raman scattering properties of the films. As expected, the films on 20-nm-thick oxide substrates showed increased Raman counts due to reduced damping of the plasmon resonance; however, the optical absorption was greater in the films on 2 nm oxide. The maximum Raman scattering was observed for average particle diameters of 13.6 and 25 nm and interparticle spacings of 3.3 and 4.1 nm for the 2 and 20 nm oxide substrates, respectively. The use of a combinatorial method resulted in significantly reduced uncertainties by avoiding multiple sample preparations and allowed unambiguous identification of optimal film parameters for the different substrates.

元の言語English
ページ(範囲)4820-4828
ページ数9
ジャーナルJournal of Physical Chemistry C
113
発行部数12
DOI
出版物ステータスPublished - 2009 3 26
外部発表Yes

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Spectroscopic ellipsometry
Silver
ellipsometry
Raman spectroscopy
silver
Oxides
oxides
Substrates
Raman scattering
Raman spectra
Silicon
Light absorption
optical absorption
Damping
damping
Particle size
spacing
preparation
thresholds
silicon

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

これを引用

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