Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse

S. Kashiwagi, R. Kato, G. Isoyama, R. Kuroda, J. Urakawa, K. Sakaue, A. Masuda, T. Nomoto, T. Gowa, M. Washio

研究成果: Paper査読

抄録

High-power extreme ultra-violet (EUV) sources are required for next generation semiconductor lithography. We start developing a compact EUV source in the spectral range of 13-14 nm, which is based on laser Compton scattering between a 7 MeV micro-bucnhed electron beam and a high intensity CO2 laser pulse. The electron beam extracted from a DC photocathode gun is micro-bunched using laser modulation techinque with the Compton wavelength at a harmonic of the seeding laser [1] before the main laser Compton scattering for EUV radiation. A considerating scheme for the compact EUV source based on laser Compton scattering with micro-bunched electron beam and the anaritical study of micro-bunch generation are described in this papar. A plan of test experiment generating micro-bunched electron beam will be also introduced in this conference.

本文言語English
ページ1869-1871
ページ数3
出版ステータスPublished - 2008
イベント11th European Particle Accelerator Conference, EPAC 2008 - Genoa, Italy
継続期間: 2008 6 232008 6 27

Conference

Conference11th European Particle Accelerator Conference, EPAC 2008
国/地域Italy
CityGenoa
Period08/6/2308/6/27

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学

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