Comparison of initial oxidation of Si(111)7×7 with ozone and oxygen investigated by second harmonic generation

Ken Nakamura*, Akira Kurokawa, Shingo Ichimura

*この研究の対応する著者

研究成果: Article査読

29 被引用数 (Scopus)

抄録

Initial oxidation by high purity ozone and molecular oxygen of Si(111)7×7 was investigated by second harmonic generation (SHG) with a 1.064 μm Nd:YAG laser. Decrease of second harmonics (SH) intensity to almost zero after 5 L ozone gas exposure, in spite of the fact that molecular oxygen kept SH intensity for the same amount of exposure, indicated that ozone is inserted into the Si-Si backbond in the subsurface layers more effectively than molecular oxygen. In the initial exposure, rates of rapid decrease in SH intensity for both ozone and oxygen adsorption were in the same order of magnitude, although O 1s x-ray photoelectron spectroscopy (XPS) intensity showed high reactivity of ozone. This is because of a difference in the information depth between SHG and XPS so that oxygen species in the subsurface layers are not effective in decreasing SH intensity. This indicates that the process of attacking backbonds is underway even with an initial exposure of <5 L.

本文言語English
ページ(範囲)2441-2445
ページ数5
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
15
4
DOI
出版ステータスPublished - 1997 1月 1
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

フィンガープリント

「Comparison of initial oxidation of Si(111)7×7 with ozone and oxygen investigated by second harmonic generation」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル