TY - JOUR
T1 - Compound nanoimprint processes and their applications for devices
AU - Mizuno, Jun
AU - Shinohara, Hidetoshi
PY - 2010
Y1 - 2010
N2 - In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.
AB - In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.
KW - Electrodeposition
KW - UV-NIL
KW - UV-photocurable resin
UR - http://www.scopus.com/inward/record.url?scp=77956971696&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77956971696&partnerID=8YFLogxK
U2 - 10.1541/ieejsmas.130.343
DO - 10.1541/ieejsmas.130.343
M3 - Article
AN - SCOPUS:77956971696
VL - 130
SP - 343
EP - 346
JO - IEEJ Transactions on Sensors and Micromachines
JF - IEEJ Transactions on Sensors and Micromachines
SN - 1341-8939
IS - 8
ER -