Comprehensive approach to MuGFET metrology

G. F. Lorusso, P. Leray, T. Vandeweyer, M. Ercken, C. Delvaux, I. Pollentier, S. Cheng, N. Collaert, R. Rooyackers, B. Degroote, M. Jurczak, S. Biesemans, O. Richard, H. Bender, A. Azordegan, J. McCormack, S. Shirke, J. Prochazka, Timothy Edward Long

研究成果: Conference contribution

5 引用 (Scopus)

抄録

As we move forward to the 45 and 32nm node, MuGFET's (Multi-Gate Field-Effect Transistor) are considered more and more as a necessary alternative to keep pace with Moore's Law. If proven manufacturable, MuGFET's could eventually replace conventional CMOS transistors within a few years. The ability to perform proper and extensive metrology in a production environment is then essential. We investigate here some of the requirements of MuGFET metrology. Accuracy and line width roughness (LWR) metrology will play an essential role, because the small dimension of the features involved. 3D metrology is required when dealing with non-planar devices. Sophisticated check of optical proximity correction (OPC) is needed in order to ensure that the design is respected. We propose here some possible solutions to address the needs of MuGFET metrology in a production-worthy fashion. A procedure to calibrate CDSEM to TEM for accuracy is developed. We performed LWR metrology of fins in a fully automated way by using CDSEM, while the 3D information is obtained by means of scatterometry. Finally, we will discuss the application of design-based metrology (DBM) to MuGFET OPC validation.

元の言語English
ホスト出版物のタイトルMetrology, Inspection, and Process Control for Microlithography XX
6152 I
DOI
出版物ステータスPublished - 2006 7 10
外部発表Yes
イベントMetrology, Inspection, and Process Control for Microlithography XX - San Jose, CA, United States
継続期間: 2006 1 202006 1 23

Other

OtherMetrology, Inspection, and Process Control for Microlithography XX
United States
San Jose, CA
期間06/1/2006/1/23

Fingerprint

Gates (transistor)
Field-effect Transistor
Metrology
metrology
field effect transistors
CD-SEM
Linewidth
Roughness
Proximity
proximity
roughness
Surface roughness
Scatterometry
fins
CMOS
Transistors
transistors
Transmission electron microscopy
requirements
transmission electron microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Lorusso, G. F., Leray, P., Vandeweyer, T., Ercken, M., Delvaux, C., Pollentier, I., ... Long, T. E. (2006). Comprehensive approach to MuGFET metrology. : Metrology, Inspection, and Process Control for Microlithography XX (巻 6152 I). [615219] https://doi.org/10.1117/12.656076

Comprehensive approach to MuGFET metrology. / Lorusso, G. F.; Leray, P.; Vandeweyer, T.; Ercken, M.; Delvaux, C.; Pollentier, I.; Cheng, S.; Collaert, N.; Rooyackers, R.; Degroote, B.; Jurczak, M.; Biesemans, S.; Richard, O.; Bender, H.; Azordegan, A.; McCormack, J.; Shirke, S.; Prochazka, J.; Long, Timothy Edward.

Metrology, Inspection, and Process Control for Microlithography XX. 巻 6152 I 2006. 615219.

研究成果: Conference contribution

Lorusso, GF, Leray, P, Vandeweyer, T, Ercken, M, Delvaux, C, Pollentier, I, Cheng, S, Collaert, N, Rooyackers, R, Degroote, B, Jurczak, M, Biesemans, S, Richard, O, Bender, H, Azordegan, A, McCormack, J, Shirke, S, Prochazka, J & Long, TE 2006, Comprehensive approach to MuGFET metrology. : Metrology, Inspection, and Process Control for Microlithography XX. 巻. 6152 I, 615219, Metrology, Inspection, and Process Control for Microlithography XX, San Jose, CA, United States, 06/1/20. https://doi.org/10.1117/12.656076
Lorusso GF, Leray P, Vandeweyer T, Ercken M, Delvaux C, Pollentier I その他. Comprehensive approach to MuGFET metrology. : Metrology, Inspection, and Process Control for Microlithography XX. 巻 6152 I. 2006. 615219 https://doi.org/10.1117/12.656076
Lorusso, G. F. ; Leray, P. ; Vandeweyer, T. ; Ercken, M. ; Delvaux, C. ; Pollentier, I. ; Cheng, S. ; Collaert, N. ; Rooyackers, R. ; Degroote, B. ; Jurczak, M. ; Biesemans, S. ; Richard, O. ; Bender, H. ; Azordegan, A. ; McCormack, J. ; Shirke, S. ; Prochazka, J. ; Long, Timothy Edward. / Comprehensive approach to MuGFET metrology. Metrology, Inspection, and Process Control for Microlithography XX. 巻 6152 I 2006.
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