Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Yota Ishito, Haruna Yano, Nobuya Hiroshiba, Shoichi Kubo, Masaru Nakagawa*

*この研究の対応する著者

研究成果: Article査読

1 被引用数 (Scopus)

抄録

A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

本文言語English
ページ(範囲)1373-1375
ページ数3
ジャーナルChemistry Letters
45
12
DOI
出版ステータスPublished - 2016 1月 1
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)

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