Cone structure formation by preferred growth of random nuclei in chemical vapor deposited epitaxial silicon films

Suguru Noda, Yuya Kajikawa, Hiroshi Komiyama

研究成果: Article

6 引用 (Scopus)
元の言語English
ページ(範囲)87-89
ページ数3
ジャーナルChemical Vapor Deposition
8
発行部数3
DOI
出版物ステータスPublished - 2002 5
外部発表Yes

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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