Construction of membrane sieves using stoichiometric and stress-reduced Si 3N 4/SiO 2/Si 3N 4 multilayer films and their applications in blood plasma separation

Dae Sik Lee*, Yo Han Choi, Yong Duk Han, Hyun C. Yoon, Shuichi Shoji, Mun Youn Jung

*この研究の対応する著者

研究成果: Article査読

15 被引用数 (Scopus)

抄録

The novelty of this study resides in the fabrication of stoichiometric and stress-reduced Si 3N 4/SiO 2/Si 3N 4 triplelayer membrane sieves. The membrane sieves were designed to be very flat and thin, mechanically stressreduced, and stable in their electrical and chemical properties. All insulating materials are deposited stoichiometrically by a low-pressure chemical vapor deposition system. The membranes with a thickness of 0.4 μm have pores with a diameter of about 1 μm. The device is fabricated on a 6" silicon wafer with the semiconductor processes. We utilized the membrane sieves for plasma separations from human whole blood. To enhance the separation ability of blood plasma, an agarose gel matrix was attached to the membrane sieves. We could separate about 1 μL of blood plasma from 5 μL of human whole blood. Our device can be used in the cell-based biosensors or analysis systems in analytical chemistry.

本文言語English
ページ(範囲)226-234
ページ数9
ジャーナルETRI Journal
34
2
DOI
出版ステータスPublished - 2012 4

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • コンピュータ サイエンス(全般)
  • 電子工学および電気工学

フィンガープリント

「Construction of membrane sieves using stoichiometric and stress-reduced Si <sub>3</sub>N <sub>4</sub>/SiO <sub>2</sub>/Si <sub>3</sub>N <sub>4</sub> multilayer films and their applications in blood plasma separation」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル