Corrosion properties of electroplated CoNiFe films

M. Saito*, K. Yamada, K. Ohashi, Y. Yasue, Y. Sogawa, T. Osaka

*この研究の対応する著者

研究成果: Article査読

39 被引用数 (Scopus)

抄録

Electroplated CoNiFe films with a saturation flux density as high as 2.1 T are potentially useful in high-density magnetic recording heads. We found that films electroplated at a high current density (15 mA/cm2) from a bath without saccharin have a sufficient anodic pitting-corrosion potential (-65 mV). We also found that the pitting-corrosion potential of films electroplated under a low current density (5 mA/cm2) from saccharin-free baths have anodic pitting-corrosion potentials of less than -300 mV. However, the corrosion resistance improved after annealing at temperatures above 100°C. The crystal-grain boundaries in the as-plated film that electroplated under a low current density from saccharin-free baths are not clear (i.e., that the phase is amorphous). But the crystal grain boundaries in the annealed film are clear. Films electroplated from baths containing saccharin also have anodic pitting-corrosion potentials of less than -300 mV. Their corrosion resistance did not improve when they were annealed at 250°C. The deterioration of the corrosion resistance is attributed to the defects that increase the face-centered cubic (111) lattice constant. One of the most important characteristics of a highly corrosion-resistant CoNiFe film is fine crystal structure with very few defects.

本文言語English
ページ(範囲)2845-2848
ページ数4
ジャーナルJournal of the Electrochemical Society
146
8
DOI
出版ステータスPublished - 1999 8

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

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