Cu/CaF2/diamond metal-insulator-semiconductor field-effect transistor utilizing self-aligned gate fabrication process
Hitoshi Umezawa, Hirotada Taniuchi, Takuya Arima, Minoru Tachiki, Kazuo Tsugawa, Sadanori Yamanaka, Daisuke Takeuchi, Hideyo Okushi, Hiroshi Kawarada
研究成果: Article › 査読
38
被引用数
(Scopus)