Current-voltage characteristics of p-InGaNn-GaN vertical conducting diodes on n+ -SiC substrates

Atsushi Nishikawa, Kazuhide Kumakura, Tetsuya Akasaka, Toshiki Makimoto

研究成果: Article査読

10 被引用数 (Scopus)

抄録

p-InGaNn-GaN vertical conducting diodes have been grown on n+ -SiC substrates by low-pressure metalorganic vapor phase epitaxy and their current-voltage characteristics have been investigated. The typical forward voltage drop was 3.8-4.0 V at a forward current density of 100 A cm2 with an on-state resistance of ∼1.3 mω cm2. The ideality factor of the samples was ∼2, meaning that the tunneling current through defects is small enough in these devices. The breakdown voltage (VB) increased with increasing n-GaN layer thickness, while it increased with decreasing carrier concentration of the layer by substituting undoped GaN for n-GaN. When the undoped GaN layer thickness was increased to 1800 nm, the highest breakdown voltage of 305 V was obtained with a low on-state resistance (Ron) of 1.51 mω cm2, leading to the figure-of-merit, (VB) 2 Ron, of 62 MW cm2.

本文言語English
論文番号233505
ページ(範囲)1-3
ページ数3
ジャーナルApplied Physics Letters
87
23
DOI
出版ステータスPublished - 2005 12 12
外部発表はい

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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