Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses

Tatsunori Shibuya, Takashi Takahashi, Kazuyuki Sakaue, Thanh Hung Dinh, Hiroyuki Hara, Takeshi Higashiguchi, Masahiko Ishino, Yuya Koshiba, Masaharu Nishikino, Hiroshi Ogawa, Masahito Tanaka, Masakazu Washio, Yohei Kobayashi, Ryunosuke Kuroda

研究成果: Article

2 引用 (Scopus)

抄録

A free-electron laser (FEL) is a robust tool for studying the interaction of intense X-rays with matter. In this study, we investigate the damage threshold and morphology of fused silica irradiated by extreme ultraviolet femtosecond pulses of a FEL. The experimental results indicate the superiority of the FEL processing. The FEL-damage threshold of fused silica at a wavelength of 13.5 nm is 0.17 J/cm2, which is 20 times lower than that of a near infrared (NIR) femtosecond laser. The relationship between the crater depth and laser fluence reveals that the effective absorption length is αeff -1 = 58 nm. The damage threshold and the absorption length are the key values for smooth crater formation. In addition, the formation of rim structures and microcracks, which are usually the critical issues in NIR laser processing, cannot be found in the interaction region. The hole diameter is maintained below the beam size at the exit.

元の言語English
記事番号151901
ジャーナルApplied Physics Letters
巻113
発行部数15
DOI
出版物ステータスPublished - 2018 10 8

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silica glass
drilling
free electron lasers
yield point
pulses
craters
infrared lasers
silicon dioxide
laser damage
microcracks
rims
fluence
interactions
wavelengths
lasers
x rays

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

これを引用

Shibuya, T., Takahashi, T., Sakaue, K., Dinh, T. H., Hara, H., Higashiguchi, T., ... Kuroda, R. (2018). Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses. Applied Physics Letters, 113(15), [151901]. https://doi.org/10.1063/1.5046125

Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses. / Shibuya, Tatsunori; Takahashi, Takashi; Sakaue, Kazuyuki; Dinh, Thanh Hung; Hara, Hiroyuki; Higashiguchi, Takeshi; Ishino, Masahiko; Koshiba, Yuya; Nishikino, Masaharu; Ogawa, Hiroshi; Tanaka, Masahito; Washio, Masakazu; Kobayashi, Yohei; Kuroda, Ryunosuke.

：: Applied Physics Letters, 巻 113, 番号 15, 151901, 08.10.2018.

研究成果: Article

Shibuya, T, Takahashi, T, Sakaue, K, Dinh, TH, Hara, H, Higashiguchi, T, Ishino, M, Koshiba, Y, Nishikino, M, Ogawa, H, Tanaka, M, Washio, M, Kobayashi, Y & Kuroda, R 2018, 'Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses', Applied Physics Letters, 巻. 113, 番号 15, 151901. https://doi.org/10.1063/1.5046125
Shibuya T, Takahashi T, Sakaue K, Dinh TH, Hara H, Higashiguchi T その他. Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses. Applied Physics Letters. 2018 10 8;113(15). 151901. https://doi.org/10.1063/1.5046125
Shibuya, Tatsunori ; Takahashi, Takashi ; Sakaue, Kazuyuki ; Dinh, Thanh Hung ; Hara, Hiroyuki ; Higashiguchi, Takeshi ; Ishino, Masahiko ; Koshiba, Yuya ; Nishikino, Masaharu ; Ogawa, Hiroshi ; Tanaka, Masahito ; Washio, Masakazu ; Kobayashi, Yohei ; Kuroda, Ryunosuke. / Deep-hole drilling of amorphous silica glass by extreme ultraviolet femtosecond pulses. ：: Applied Physics Letters. 2018 ; 巻 113, 番号 15.
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AU - Kobayashi, Yohei

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