Densification of glassy carbon by fluorine ion implantation

Hiroshi Toida*, Keiichi Terashima, Tomohiro Kobayashi, Minoru Osada, Kowashi Watanabe, Masaya Iwaki

*この研究の対応する著者

研究成果: Article査読

7 被引用数 (Scopus)

抄録

A study has been made of the surface layer modification of glassy carbon (GC) by fluorine (F) ion implantation. F+-ion implantation into GC was performed at an energy of 150 keV with doses ranging from 5 × 1014 to 5 × 1016 ions/cm2 near room temperature. The changes in structure, composition and surface morphology of implanted specimens were examined by means of Raman spectroscopy (Raman), secondary ion mass spectrometry (SIMS) and atomic force microscopy (AFM), respectively. The Raman spectra for high fluences indicate the formation of amorphous carbon. The SIMS depth profiles of F-atoms are Gaussian-like distributions, and the peaks shift toward the surface as the fluence increases. The AFM measurements show that a step height of approximately 108 nm is observed at a fluence of 5 × 1016 ions/cm2. From the results of peak shifts and step heights, it is concluded that F-ion implantation into GC induces a densification of the surface layer.

本文言語English
ページ(範囲)532-536
ページ数5
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
175-177
DOI
出版ステータスPublished - 2001 4月
外部発表はい

ASJC Scopus subject areas

  • 表面、皮膜および薄膜
  • 器械工学
  • 表面および界面

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