Densification of SiC by colloidal processing and SPS without sintering additives

T. S. Suzuki*, T. Uchikoshi, Y. Sakka

*この研究の対応する著者

研究成果: Article査読

13 被引用数 (Scopus)

抄録

Silicon carbide is one of the most important ceramics used as structural and functional materials in a wide variety of applications. Many studies have reported the densification of SiC using oxide and nonoxide additives such as the Al2O3, B4C and Al-B-C system. However, it is difficult to densify SiC at temperatures below 2000°C without sintering additives even if spark plasma sintering (SPS) is used. The authors attempted to densify SiC using colloidal processing and SPS without sintering additives. A commercially available SiC powder with the average particle size of 0.55 mm was used as the starting material. The densities of the green body prepared by slip casting and the sintered body by SPS were 65.5 and 98.7% respectively.

本文言語English
ページ(範囲)85-88
ページ数4
ジャーナルAdvances in Applied Ceramics
113
2
DOI
出版ステータスPublished - 2014 2月
外部発表はい

ASJC Scopus subject areas

  • セラミックおよび複合材料
  • 産業および生産工学

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