Deposition of thin nanoporous silica layers on solid surfaces

Makoto Ogawa, Naoki Shimura, André Ayral

研究成果: Article査読

25 被引用数 (Scopus)

抄録

A new and versatile method to prepare nanoporous silica thin layers on a solid substrate was investigated. The deposition of the nanoporous silica layers was conducted using C16TAC, deionized water, methanol, and a 27% aqueous ammonia solution. The nanoporous silica layer with the thickness of about 70 nm and with disordered mesostructure formed on a silicon wafer. The mesoporous silica coating was regarded as a way to impart new functions such as molecular sieving on catalysts and adsorbents. The method is a versatile way to prepare mesoporous silica layers on a flat substrate and to coat particles due to the very simple procedure, mild reaction conditions, and reproducible results.

本文言語English
ページ(範囲)1715-1718
ページ数4
ジャーナルChemistry of Materials
18
7
DOI
出版ステータスPublished - 2006 4 4

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

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