Deposition techniques of c-axis-tilted ScAlN films by conventional RF magnetron sputtering

Kazuki Arakawa*, Takahiko Yanagitani, Kazuhiko Kano, Akihiko Teshigahara, Morito Akiyama

*この研究の対応する著者

研究成果: Conference contribution

21 被引用数 (Scopus)

抄録

It is difficult to synthesize c-axis tilted ScAlN films by using co-sputtering because unidirectional oblique incident of sputtered particles is needed to obtain c-axis tilted structure. To realize the oblique incident single source sputtering technique was proposed for c-axis tilted film deposition. ScAl alloy target was used to achieve ScAlN film synthesis instead of co-sputtering. As a result c-axis highly tilted ScAlN film (tilt angle 33) was obtained by using this deposition technique. From the result of film transducer loss measurement we found that longitudinal and shear elasticity of AlN decreases by adding Sc. c-axis highly tilted ScAlN film showed giant k 15' values of 0.32 in spite of its low degree of orientation.

本文言語English
ホスト出版物のタイトル2010 IEEE International Ultrasonics Symposium, IUS 2010
ページ1050-1053
ページ数4
DOI
出版ステータスPublished - 2010
外部発表はい
イベント2010 IEEE International Ultrasonics Symposium, IUS 2010 - San Diego, CA, United States
継続期間: 2010 10月 112010 10月 14

出版物シリーズ

名前Proceedings - IEEE Ultrasonics Symposium
ISSN(印刷版)1051-0117

Other

Other2010 IEEE International Ultrasonics Symposium, IUS 2010
国/地域United States
CitySan Diego, CA
Period10/10/1110/10/14

ASJC Scopus subject areas

  • 音響学および超音波学

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