Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process

Shingo Ichimura*, Hidehiko Nonaka, Yoshiki Morikawa, Tsuyoshi Noyori, Tetsuya Nishiguchi, Mitsuru Kekura

*この研究の対応する著者

研究成果: Article査読

22 被引用数 (Scopus)

抄録

An ozone generator meant for continuously supplying highly concentrated (HC) ozone gas for low-temprature oxidation process was presented. The generator comprised of four ozone vessels and could supply a constant flow of HC ozone by four modes of operations, such as accumulation, vaporization, evacuation and cooling to each of the ozone vessels. The maximum flow rate for a continuous supply of ozone gas was 60 sccm with a flux stability of ± 1.1%. It was shown that ozone concentration of over 99.5 % could be achieved by the ozone generators.

本文言語English
ページ(範囲)1410-1414
ページ数5
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
22
4
DOI
出版ステータスPublished - 2004 7月 1
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

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