Development of a light-deactivatable PSA via photodimerization

Scott R. Trenor, Timothy Edward Long, Brian J. Love

研究成果: Article査読

37 被引用数 (Scopus)

抄録

Photoreactive pressure-sensitive (PSAs) were developed to create photo-adhesives deactivatable resins. Coumarin-functionalized poly(2-ethylhexyl acrylate-cohydroxyethyl acrylate) was prepared via traditional free-radical polymerization followed by quantitative hydroxyl group esterification and studied as model photoactive PSAs. The polymers were solution-cast into films and photocrosslinked via dimerization of the coumarin derivatives with ultraviolet-A (UVA) light irradiation ( > 300 nm). Ultraviolet-Visible (UV-Vis) spectroscopy indicated that approximately 60% of the coumarin groups photodimerized when exposed to 22 J cm-2 of UVA irradiation. The formation of reversible coumarin crosslinks gelled the model PSA and reduced peel strength from 1.62 to O. 05N/mm. UVC irradiation photocleaved the coumarin dimers, reducing the crosslink density and raising the peel strength to O. 10N/mm. This reversibility of the coumarin photodimerization and consequent peel-strength modulation may provide a mechanism for the repeated use of these model adhesives.

本文言語English
ページ(範囲)213-229
ページ数17
ジャーナルJournal of Adhesion
81
2
DOI
出版ステータスPublished - 2005 2 1
外部発表はい

ASJC Scopus subject areas

  • Chemistry(all)
  • Mechanics of Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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