We have developed a precise sub-µm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 µm and a period of 1.59 µm on a 2-µm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.
|ジャーナル||The transactions of the Institute of Electrical Engineers of Japan.A|
|出版ステータス||Published - 2005|
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