Development of Oxidation Sources in Preparation of High-Tc Oxide Superconductor Thin Films Using the Molecular Beam Epitaxy Method

Hidehiko Nonaka, Shingo Ichimura, Takashi Shimizu, Kazuo Arai

研究成果: Article査読

10 被引用数 (Scopus)

抄録

: Film preparation of oxide superconductors, mainly of the 1-2-3 (RBa2Cu3Ox) and Bi-containing (Bi-Sr-Ca-Cu-O) systems, by evaporation of either metals or metal compounds by low pressure is summarized, with a particular focus on the development of oxidation sources essential to the technique. Oxidizing reagents that enable the oxidation of metal evaporates to take place in high (0.1 to 10-3Pa) or even ultra-high (<10-5Pa) vacuum are summarized using the experiments of those who tried to apply the molecular beam epitaxy method to atomically controlled fabrication of thin films of the material, especially for device processing. The evaporation in various kinds of oxidizing atmosphere, including the simple method of in situ annealing of the metal layers in oxygen to the more advanced in situ preparation of the films with strong oxidizing reagents such as atomic oxygen, ozone, nitric oxide, etc. along with the thermochemistry of the oxidation of metals by low pressure with these reagents is reviewed.

本文言語English
ページ(範囲)285-338
ページ数54
ジャーナルCritical Reviews in Solid State and Materials Sciences
20
4
DOI
出版ステータスPublished - 1995 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 化学工学(全般)
  • 凝縮系物理学
  • 物理化学および理論化学
  • 電子工学および電気工学

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