Development of soft x-ray laser irradiation beamline for ablation and damage study

Masahiko Ishino, Thanh Hung Dinh, Noboru Hasegawa, Kazuyuki Sakaue, Takeshi Higashiguchi, Satoshi Ichimaru, Masatoshi Hatayama, Masakazu Washio, Masaharu Nishikino

研究成果: Conference contribution

抄録

The interactions of short pulse lasers with matter are interesting subjects not only in applications such as surface fabrication but also in physical phenomena for study. Optical short pulse lasers have abilities to occur the ablation phenomena accompanying the creation of high temperature, high pressure, and excited states of electrons. The picosecond soft x-ray laser (SXRL) pulse also has ability to occur the ablation. The SXRL having the wavelength of 13.9 nm and duration of 7 ps is one of attractive x-ray source for ablation study, because the ablation threshold obtained with the focused SXRL pulse is much smaller than those obtained with other lasers having longer durations and/or longer wavelengths. The low ablation threshold of a material for the SXRL beam has a possibility of efficient nanometer scale surface machining by an ablation. The ablation study will lead to the physical research and the direct surface machining. In addition, the wavelength of the SXRL is very close to the wavelength of the extreme ultraviolet (EUV) lithography system (λ = 13.5 nm). In the presentation, we report on development of the soft x-ray laser irradiation system. The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. The SXRL has an ability to confirm the ablation threshold and to examine the damage property of EUV optical elements, which have the same specifications of those in the EUV lithography. And more, it is possible to evaluate the doses for sensitivity of resists.

本文言語English
ホスト出版物のタイトルLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV
編集者Tetsuya Makimura, Gediminas Raciukaitis, Carlos Molpeceres
出版社SPIE
ISBN(電子版)9781510624528
DOI
出版ステータスPublished - 2019
イベントLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV 2019 - San Francisco, United States
継続期間: 2019 2 42019 2 6

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
10905
ISSN(印刷版)0277-786X
ISSN(電子版)1996-756X

Conference

ConferenceLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV 2019
国/地域United States
CitySan Francisco
Period19/2/419/2/6

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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