TY - GEN
T1 - Development of soft x-ray laser irradiation beamline for ablation and damage study
AU - Ishino, Masahiko
AU - Dinh, Thanh Hung
AU - Hasegawa, Noboru
AU - Sakaue, Kazuyuki
AU - Higashiguchi, Takeshi
AU - Ichimaru, Satoshi
AU - Hatayama, Masatoshi
AU - Washio, Masakazu
AU - Nishikino, Masaharu
N1 - Funding Information:
Authors acknowledge the financial support from the research program of “QST Mirai-Lab”. We are grateful to Y. Hosaka, K. Yoshimura and H. Yamamoto of QST Takasaki for collaboration in this work. This presentation were supported by Quantum Leap Flagship Program (MEXT Q-LEAP).
Publisher Copyright:
© COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.
PY - 2019
Y1 - 2019
N2 - The interactions of short pulse lasers with matter are interesting subjects not only in applications such as surface fabrication but also in physical phenomena for study. Optical short pulse lasers have abilities to occur the ablation phenomena accompanying the creation of high temperature, high pressure, and excited states of electrons. The picosecond soft x-ray laser (SXRL) pulse also has ability to occur the ablation. The SXRL having the wavelength of 13.9 nm and duration of 7 ps is one of attractive x-ray source for ablation study, because the ablation threshold obtained with the focused SXRL pulse is much smaller than those obtained with other lasers having longer durations and/or longer wavelengths. The low ablation threshold of a material for the SXRL beam has a possibility of efficient nanometer scale surface machining by an ablation. The ablation study will lead to the physical research and the direct surface machining. In addition, the wavelength of the SXRL is very close to the wavelength of the extreme ultraviolet (EUV) lithography system (λ = 13.5 nm). In the presentation, we report on development of the soft x-ray laser irradiation system. The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. The SXRL has an ability to confirm the ablation threshold and to examine the damage property of EUV optical elements, which have the same specifications of those in the EUV lithography. And more, it is possible to evaluate the doses for sensitivity of resists.
AB - The interactions of short pulse lasers with matter are interesting subjects not only in applications such as surface fabrication but also in physical phenomena for study. Optical short pulse lasers have abilities to occur the ablation phenomena accompanying the creation of high temperature, high pressure, and excited states of electrons. The picosecond soft x-ray laser (SXRL) pulse also has ability to occur the ablation. The SXRL having the wavelength of 13.9 nm and duration of 7 ps is one of attractive x-ray source for ablation study, because the ablation threshold obtained with the focused SXRL pulse is much smaller than those obtained with other lasers having longer durations and/or longer wavelengths. The low ablation threshold of a material for the SXRL beam has a possibility of efficient nanometer scale surface machining by an ablation. The ablation study will lead to the physical research and the direct surface machining. In addition, the wavelength of the SXRL is very close to the wavelength of the extreme ultraviolet (EUV) lithography system (λ = 13.5 nm). In the presentation, we report on development of the soft x-ray laser irradiation system. The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto sample surface. The SXRL has an ability to confirm the ablation threshold and to examine the damage property of EUV optical elements, which have the same specifications of those in the EUV lithography. And more, it is possible to evaluate the doses for sensitivity of resists.
KW - ablation
KW - evaluation beamline
KW - irradiation damage
KW - soft x-ray laser
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U2 - 10.1117/12.2513390
DO - 10.1117/12.2513390
M3 - Conference contribution
AN - SCOPUS:85067999342
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV
A2 - Makimura, Tetsuya
A2 - Raciukaitis, Gediminas
A2 - Molpeceres, Carlos
PB - SPIE
T2 - Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV 2019
Y2 - 4 February 2019 through 6 February 2019
ER -