Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator

Norikazu Taniyama*, Minoru Kudo, Osamu Matsumoto, Hiroshi Kawarada

*この研究の対応する著者

研究成果: Article査読

21 被引用数 (Scopus)

抄録

Diamond deposition on a large area silicon wafer substrate (ø100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.

本文言語English
ページ(範囲)L698-L700
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
40
7 A
出版ステータスPublished - 2001 7 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(その他)
  • 物理学および天文学(全般)

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