抄録
Diamond deposition on a large area silicon wafer substrate (ø100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the entire substrate. Diamond precursors are emitted radially onto a silicon substrate from the plasma sphere generated at the tip of the antenna. The possibility of diamond deposition outside the plasma sphere is discussed using a semi-empirical equation.
| 本文言語 | English |
|---|---|
| ページ（範囲） | L698-L700 |
| ジャーナル | Japanese Journal of Applied Physics, Part 2: Letters |
| 巻 | 40 |
| 号 | 7 A |
| DOI | |
| 出版ステータス | Published - 2001 7月 1 |
ASJC Scopus subject areas
- 工学（全般）
- 物理学および天文学（全般）