DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION.

N. Atoda, H. Kawakatsu, H. Tanino, S. Ichimura, M. Hirata, K. Hoh

研究成果: Conference article査読

17 被引用数 (Scopus)

抄録

With synchrotron radiation from the storage ring ETL-TERAS, the influence of Fresnel diffraction on replicated patterns was investigated. Spatial intensity distributions due to the diffraction were calculated with Fresnel integrals and compared with replicated patterns. Pattern degradation due to the diffraction depends on a parameter U//0 equals W/(G//p lambda /2)** one-half , where W is the pattern width, G//p the mask-to-wafer distance, and lambda the wavelength. From the calculation and the experiments it is concluded that the value of U//0 is needed to be larger than about three for a satisfactory pattern replication. Work with an experimental stencil mask with patterns of submicron dimensions is also described briefly.

本文言語English
ページ(範囲)1267-1270
ページ数4
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
1
4
DOI
出版ステータスPublished - 1983 1 1
外部発表はい
イベントProc of the Int Symp on Electron, Ion, and Photon Beams - Los Angeles, CA, USA
継続期間: 1983 5 311983 6 3

ASJC Scopus subject areas

  • 凝縮系物理学
  • 電子工学および電気工学

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