Direct engraving of mask patterns in a resist film was tried by exposing with synchrotron radiation. Using a stencil mask made of a Si//3N//4 substrate, submicron structures could be successfully replicated. Fundamental aspects of resist decomposition by synchrotron radiation were also investigated by mass and electron spectroscopy.
|ジャーナル||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|出版ステータス||Published - 1983 1 1|
|イベント||Proc of the Int Symp on Electron, Ion, and Photon Beams - Los Angeles, CA, USA|
継続期間: 1983 5 31 → 1983 6 3
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering