抄録
Direct engraving of mask patterns in a resist film was tried by exposing with synchrotron radiation. Using a stencil mask made of a Si//3N//4 substrate, submicron structures could be successfully replicated. Fundamental aspects of resist decomposition by synchrotron radiation were also investigated by mass and electron spectroscopy.
本文言語 | English |
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ページ(範囲) | 1076-1079 |
ページ数 | 4 |
ジャーナル | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
巻 | 1 |
号 | 4 |
DOI | |
出版ステータス | Published - 1983 1 1 |
外部発表 | はい |
イベント | Proc of the Int Symp on Electron, Ion, and Photon Beams - Los Angeles, CA, USA 継続期間: 1983 5 31 → 1983 6 3 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering