TY - JOUR
T1 - DIRECT ENGRAVING ON POSITIVE RESISTS BY SYNCHROTRON RADIATION.
AU - Ichimura, S.
AU - Hirata, M.
AU - Tanino, H.
AU - Atoda, N.
AU - Ono, M.
AU - Hoh, K.
PY - 1983/1/1
Y1 - 1983/1/1
N2 - Direct engraving of mask patterns in a resist film was tried by exposing with synchrotron radiation. Using a stencil mask made of a Si//3N//4 substrate, submicron structures could be successfully replicated. Fundamental aspects of resist decomposition by synchrotron radiation were also investigated by mass and electron spectroscopy.
AB - Direct engraving of mask patterns in a resist film was tried by exposing with synchrotron radiation. Using a stencil mask made of a Si//3N//4 substrate, submicron structures could be successfully replicated. Fundamental aspects of resist decomposition by synchrotron radiation were also investigated by mass and electron spectroscopy.
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U2 - 10.1116/1.582636
DO - 10.1116/1.582636
M3 - Conference article
AN - SCOPUS:0020832282
VL - 1
SP - 1076
EP - 1079
JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
SN - 1071-1023
IS - 4
T2 - Proc of the Int Symp on Electron, Ion, and Photon Beams
Y2 - 31 May 1983 through 3 June 1983
ER -