Micro structures of polytetrafluoroethylene (PTFE) and crosslinked PTFE (RX-PTFE), which has remarkable thermal stability, chemical stability and electrical insulation, have been processed by focused ion beam (FIB). Fine structures of radiation crosslinked PTFE (RX-PTFE),with the size of several tens of μm, have been fabricated by FIB maskless direct etching. PTFE and RX-PTFE with various crosslinking densities, which were controlled from 0.23 % to 1.2 %, were irradiated by 30 keV/ 2.9-12 nA Ga+ ion beam with the fluence of 0.3 × 1016 - 4.5 × 1016 ions/cm 2. It was found that the etching rate of PTFE and RX-PTFE was approximately 10-15 μm/(ion/cm2).
|出版ステータス||Published - 2006 12月 1|
|イベント||55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan|
継続期間: 2006 9月 20 → 2006 9月 22
|Other||55th Society of Polymer Science Japan Symposium on Macromolecules|
|Period||06/9/20 → 06/9/22|
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