Direct etching process using focused ion beam for microfabrication of crosslinked PTFE

Nozomi Miyoshi, Yoshinori Matsui, Akihiro Oshima, Shu Seki, Katsuyoshi Murata, Etsuko Kato, Seiichi Tagawa, Masakazu Washio

研究成果: Paper査読

抄録

Micro structures of polytetrafluoroethylene (PTFE) and crosslinked PTFE (RX-PTFE), which has remarkable thermal stability, chemical stability and electrical insulation, have been processed by focused ion beam (FIB). Fine structures of radiation crosslinked PTFE (RX-PTFE),with the size of several tens of μm, have been fabricated by FIB maskless direct etching. PTFE and RX-PTFE with various crosslinking densities, which were controlled from 0.23 % to 1.2 %, were irradiated by 30 keV/ 2.9-12 nA Ga+ ion beam with the fluence of 0.3 × 1016 - 4.5 × 1016 ions/cm 2. It was found that the etching rate of PTFE and RX-PTFE was approximately 10-15 μm/(ion/cm2).

本文言語English
ページ3314-3315
ページ数2
出版ステータスPublished - 2006 12 1
イベント55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan
継続期間: 2006 9 202006 9 22

Other

Other55th Society of Polymer Science Japan Symposium on Macromolecules
CountryJapan
CityToyama
Period06/9/2006/9/22

ASJC Scopus subject areas

  • Engineering(all)

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