Direct silylation of a mesostructured precursor for novel mesoporous silica KSW-2

Tetsuro Shigeno, Masatsune Nagao, Tatsuo Kimura, Kazuyuki Kuroda

研究成果: Article査読

22 被引用数 (Scopus)

抄録

A mesostructured precursor for KSW-2 with semi-squared mesopores was directly modified with chlorotrimethylsilane and chlorooctyldimethylsilane for the first time. The silylated products were characterized by powder XRD, IR, 29Si MAS NMR, CHN analysis, and N2 and water vapor adsorption measurements. Mesoporous silica KSW-2 prepared by calcination of the precursor was also silylated in a similar manner. The mesostructures of the precursor and of KSW-2 were retained after silylation. The characteristics of semi-squared mesopores remarkably changed; the hydrophobicity of the derivatives increased substantially after silylation. The BET surface area, the pore volume, and the width of the semi-squared mesopores decreased after silylation, and the degree of the decrease is larger for the octyldimethylsilyl derivatives than that for the trimethylsilyl derivatives. The numbers of the silyl groups grafted on the directly silylated derivatives are larger than those on the silylated KSW-2. In addition, calcination of the trimethylsilylated products yielded mesoporous silica with the same structure in which the pore wall thickness was increased because of the participation of the silyl groups to the silica network by oxidation.

本文言語English
ページ(範囲)8102-8107
ページ数6
ジャーナルLangmuir
18
21
DOI
出版ステータスPublished - 2002 10 15

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

フィンガープリント 「Direct silylation of a mesostructured precursor for novel mesoporous silica KSW-2」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル