DRY LIFTOFF METHOD BY SUBLIMATION OF MOLYBDENUM OXIDE.

Noriyoshi Yamauchi, Toshiaki Yachi, Tsutomu Wada

研究成果: Chapter

3 引用 (Scopus)

抄録

A new liftoff method is proposed in which the film to be lifted-off is deposited on a molybdenum pattern. After the deposition, liftoff is done by thermally oxidizing the molybdenum and sublimating the molybdenum oxide. One micro meter thick sputter-deposited silicon dioxide was successfully delineated by this dry liftoff method. Dry liftoff is possible in an oxygen ambient at a temperature of 700 degree C or higher. The rate at which the molybdenum underneath the silicon dioxide is removed increases with the oxidation temperature and is typically 30 mu m/min at 900 degree C.

元の言語English
ホスト出版物のタイトルJapanese Journal of Applied Physics, Part 2: Letters
ページ595-596
ページ数2
22
エディション9
出版物ステータスPublished - 1983 9
外部発表Yes

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Molybdenum oxide
Sublimation
Molybdenum
Silica
Oxidation
Temperature
Oxygen

ASJC Scopus subject areas

  • Engineering(all)

これを引用

Yamauchi, N., Yachi, T., & Wada, T. (1983). DRY LIFTOFF METHOD BY SUBLIMATION OF MOLYBDENUM OXIDE.Japanese Journal of Applied Physics, Part 2: Letters (9 版, 巻 22, pp. 595-596)

DRY LIFTOFF METHOD BY SUBLIMATION OF MOLYBDENUM OXIDE. / Yamauchi, Noriyoshi; Yachi, Toshiaki; Wada, Tsutomu.

Japanese Journal of Applied Physics, Part 2: Letters. 巻 22 9. 編 1983. p. 595-596.

研究成果: Chapter

Yamauchi, N, Yachi, T & Wada, T 1983, DRY LIFTOFF METHOD BY SUBLIMATION OF MOLYBDENUM OXIDE.Japanese Journal of Applied Physics, Part 2: Letters. 9 Edn, 巻. 22, pp. 595-596.
Yamauchi N, Yachi T, Wada T. DRY LIFTOFF METHOD BY SUBLIMATION OF MOLYBDENUM OXIDE. : Japanese Journal of Applied Physics, Part 2: Letters. 9 版 巻 22. 1983. p. 595-596
Yamauchi, Noriyoshi ; Yachi, Toshiaki ; Wada, Tsutomu. / DRY LIFTOFF METHOD BY SUBLIMATION OF MOLYBDENUM OXIDE. Japanese Journal of Applied Physics, Part 2: Letters. 巻 22 9. 版 1983. pp. 595-596
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