We have investigated the effect of base pressure of the sputtering chamber on the structure and magnetic properties of the FePt thin films. The A1-FePt thin films deposited at room temperature, at a low base pressure of 5.5×10-7 Torr was ordered to the L10 structure at a low annealing temperature of 200 °C and a highly ordered L10 phase was formed by annealing the film at 300 °C. On the other hand, for the A1-FePt thin films deposited at a higher base pressure of 5.5×10-5 Torr, the ordering to the L10 structure took place at a higher annealing temperature of 400 °C and a fully ordered L10 phase was obtained when the film was annealed at 600 °C. These observations suggest that the low base pressure of the sputtering chamber is effective to reduce the kinetic ordering temperature to a much lower annealing temperature of 200 °C.
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