Effect of carbon content on the electrical resistivity of electrodeposited copper

Tetsuya Osaka*, Noriyuki Yamachika, Masahiro Yoshino, Madoka Hasegawa, Yoshinori Negishi, Yutaka Okinaka

*この研究の対応する著者

研究成果査読

23 被引用数 (Scopus)

抄録

Copper films electrodeposited from acid sulfate baths containing conventional additives used in the damascene process for the fabrication of ultralarge-scale integration interconnects were analyzed quantitatively to investigate the relation between carbon content and electrical resistivity of the deposit. In the as-deposited state, the resistivity of deposits that did not exhibit self-annealing effects in scanning ion microscope examination increased almost linearly with carbon content in the range of 0.002-0.045 wt %. The deposits that exhibited self-annealing effects showed higher resistivity values at identical carbon contents. After self-annealing, resistivity values of all deposits varied almost linearly with carbon content.

本文言語English
ページ(範囲)D15-D17
ジャーナルElectrochemical and Solid-State Letters
12
3
DOI
出版ステータスPublished - 2009 1 19

ASJC Scopus subject areas

  • 化学工学(全般)
  • 材料科学(全般)
  • 物理化学および理論化学
  • 電気化学
  • 電子工学および電気工学

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