Effect of carrier gas on structure of plasma polymerized tetrafluoroethylene films

Toshiki Nakano, Yasuhiro Kasama, Yoshimichi Ohki, Kichinosuke Yahagi

研究成果査読

9 被引用数 (Scopus)

抄録

Thin films were polymerized by introducing tetrafluoroethylene gas into the “tail-flame” of a glow discharge of hydrogen or argon used as a carrier gas. Compared with argon, hydrogen gives a higher deposition rate at low discharge power and a lower rate at high discharge power. ESR, ESCA and IR measurements showed that films polymerized using hydrogen as a carrier gas are crosslinked to a higher degree and have more radicals than those polymerized using argon. The former films have higher tan δ values than the latter films. These results arise from the competing processes of polymerization and ablation in the glow-discharge plasma.

本文言語English
ページ(範囲)83-86
ページ数4
ジャーナルJapanese journal of applied physics
24
1 R
DOI
出版ステータスPublished - 1985 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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