Effect of deposition site condition on the growth process of electroless CoNiP films was investigated by employing the intermediate 'treatment' step during the deposition. The effect of chemical species in the bath on the deposition sites, i.e., the film growth process, was examined using scanning electron microscopy (SEM) and atomic force microscopy (AFM). By changing the pH of the solutions for the 'treatment' step, it was found that the 'treatment' with higher pH solution resulted in the formation of smaller grains which possess lower perpendicular coercivity, Hc(⊥). From these results, ammonia in the deposition bath results in the inhibition of the growth of crystallites, which leads lower Hc(⊥). Based upon this, a model of the growth process of the CoNiP films was proposed.
|出版ステータス||Published - 1999 6月 1|
|イベント||Proceedings of the 1999 2nd International Symposium on Electrochemical Microsystems Technologies - Electrochemical Applications of Microtechnology - Grevenbroich, Ger|
継続期間: 1999 9月 9 → 1999 9月 11
ASJC Scopus subject areas